ALD Precursors — Particle Atomic Layer Deposition

Particle Atomic Layer Deposition is an ALD method that employs the vapour phase method, and deposits thin layers onto a substrate. Throughout the PALD (and ALD) process, a substrate’s surface is exposed to several precursors; these precursors are supplied sequentially rather than overlapping.

The precursor molecule interacts with the surface in a self-limiting manner in each alternating pulse, ensuring that the reaction terminates after all of the reactive sites on the substrate have been used. The kind of precursor-surface contact determines whether an ALD cycle is complete. Depending on the need, the ALD cycle can be repeated more than once to increase the number of thin-film layers.

Some thermally unstable ALD precursors can still be used in ALD precursor manufacturing as long as their disintegration rate is moderate. The PALD process is frequently carried out at lower temperatures, which is advantageous when working with fragile substrates.

With PALD, a large variety of materials may be deposited, including oxides, metals, sulfides, and fluorides. Depending on the application, these coatings can display various characteristics.

The PALD technique is popular because it produces incredibly accurate ultra-thin nano-layers on various substrates, including micron- and sub-micron-sized particles. The conformal and hole-free nano-layers produced by PALD are by their very nature. This is why at Optima chem, we make this a priority to satisfy you in any way possible with top-notch goods and services

Particle Atomic Layer Deposition Application

Since atomic layer deposition has such a wide variety of applications, it is now often used to create thin films and nanocoatings.

The employment of ALD thin films in the semiconductor industry is one of the most well-liked applications as devices get smaller. These goods may be made even smaller while maintaining the high level of performance we expect from consumer electronics, thanks to the thin films and coatings made with ALD.

It has been shown that lithium-ion batteries’ anode and cathode electrodes may be much safer by employing Particle ALD to deposit simple and complicated metal oxide nano-coatings around each tiny particle that makes up the powder coating battery lifetime and increases battery capacity. ALD coating on particles at an economy of scale is now a commercially feasible technique for battery producers thanks to the patent and intellectual property from Optima Chem, which are also largely to blame for the increased use of ALD in producing lithium-ion batteries.

Another use for PALD is in nano-coated catalysts. These coatings can make catalysts more thermally stable, change the catalyst’s chemical or physical characteristics, or vary the catalyst’s selectivity according to the process.

Using nanoporous materials for drug delivery, tissue engineering, and implants has increased the appeal of atomic layer deposition in the biomedical sector.

Optima chem is proud to assist our clients in utilizing the technology to enhance their goods and services. We have created an original, economically feasible atomic layer deposition technique. Please contact us if you need any information regarding our ALD precursors or nanocoatings on particles.