The Essentials of Precursor Selection in Atomic Layer Deposition/CVD
The deposition process of a solid material such as nanotubes or nanowires, thin film, or particle on a substrate by the generation of reactive species in the gaseous phase is known as chemical vapor deposition (CVD). When the heated substrate comes in contact with precursor gasses, a reactive species is generated.
There are many forms of chemical vapor deposition that include low-pressure chemical vapor deposition, metal-organic chemical vapor deposition, and atmospheric pressure chemical vapor deposition. Metal organic species are used as precursors to form thin films of metal nitrides, metal oxides and other kinds of metallic compounds.
Optimal Chemical is a full-service chemical company having the infrastructure to turn ideas into solutions and products. We are a leading worldwide ALD precursor manufacturing and supplier of specialty chemicals, custom chemical manufacturing, and toll services.
This blog highlights the importance of precursor selection in ALD. Continue reading to learn more.
Atomic Layer Deposition (ALD)
ALD is a special kind of CVD where it is possible to have an atomic-scale deposition. Certain number of cursors is fed simultaneously into the reaction chamber, one per time. It goes through self-limiting surface reactions. This happens in such a way that an equal amount of material is dropped during every reaction cycle. By this, layers of varying materials with minimal defects, highly dense, uniform thickness, and smooth are formed.
Atomic Layer Deposition has gained much interest as a means of creating nanosized coatings and nanosized thin films on different substrates. The coatings/thin films made by Atomic Layer Deposition are very conformal and can be used on several geometrically complex surfaces.
Regarding application, it is a technique that has been used in various scientific fields, including drug delivery, semiconductor technologies, tissue engineering, battery electrodes, microelectromechanical systems, and transistor applications.
The Essentials of the Right Selection of Atomic Layer Deposition Selection
Process conditions have an impact on the properties of materials that are produced with the help of Atomic Layer Deposition. Here, the appropriate selection of ALD precursors is essential in order to get the intended material.
It is crucial that precursors are thermally stable but volatile so that they do not decompose during the process of vaporization and are soluble in an inert liquid or solvent at room temperature. In addition, they must possess preferential reactivity towards the growing film and the substrate. It is also essential that precursors have self-limiting reactivity with the film surface and the substrate.
Not more than one element is contributed to the deposited film, with the other molecules vaporized during the process. Some compounds can donate more than one element and reduce the number of reactants required for a particular process.
Optima Chemical is a leading ALD precursor manufacturing company. We possess an engineering set of skills that helps us to produce high hazard, high energy, and sensitive chemistry. We also have two manufacturing plants that are based in the US; here, we manufacture our own products and for our partners. To experience top-quality service in ALD precursor, contact us now.
